{"id":23582,"date":"2024-10-18T13:12:22","date_gmt":"2024-10-18T05:12:22","guid":{"rendered":"https:\/\/www.hermes.com.tw\/product\/icp-etcher\/"},"modified":"2025-11-07T10:58:31","modified_gmt":"2025-11-07T02:58:31","slug":"icp-etcher","status":"publish","type":"product","link":"https:\/\/www.hermes.com.tw\/en\/product\/icp-etcher\/","title":{"rendered":"Inductively Couple Plasma Etcher"},"content":{"rendered":"

Hermes-Epitek’s compound semiconductor etching system offers reliable and cost-effective solutions for the manufacturing of power devices, RF components and optical-communication devices.<\/p>\n

\"\"<\/p>\n

The etching system is designed based on advanced 12-inch semiconductor processing equipment, leveraging the experience gained from 12-inch advanced semiconductor etching processes. As a result, it is built as next-generation 6\/8-inch semiconductor etching equipment. The system offers numerous process adjustment capabilities, making it adaptable to a wide range of stringent process specifications.<\/p>\n

\"\"
ICP Eetcher offers flexible 4 chamber configurations.<\/figcaption><\/figure>\n

 <\/p>\n","protected":false},"excerpt":{"rendered":"

Hermes-Epitek’s compound semiconductor etching system offers reliable and cost-effective solutions for the manufacturing of power devices, RF components and optical-communication devices. The etching system is designed based on advanced 12-inch semiconductor processing equipment, leveraging the experience gained from 12-inch advanced semiconductor etching processes. As a result, it is built as next-generation 6\/8-inch semiconductor etching equipment. 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