The Micronic LRS laser pattern generators are designed for high quality chrome display photomasks. The field proven performance with unsurpassed mura control has made the systems the de facto industry standard for large area flat panel display applications.
Distortion Control function makes it possible to adjust the coordinate system of the pattern
Alignment option can be used to expose a second layer on a photomask accurately aligned to the first exposure
Z-Correction function corrects for registration errors caused by flatness variations on the rear of the mask
