1989
ĦE Established relationship with Tokyo Electron Ltd. and introduced full line of Tokyo Electron Ltd. equipments to Taiwan
1988
ĦE Introduced state-of-the-art ASM Lithography
Steppers
1987
ĦE Actively constructed service infrastructure
(Trained Service & Application Engineers, Spare Parts Logistics,etc..)
to meet the requirements of VLSI era of Taiwan (ERSO VLSI Project,
later-on became TSMC Fab1)
1986
ĦE Introduced Wsix CVD Technology into Taiwan
1985
ĦE Founded Episil Technologies as partly-owned
subsidiary Representative agreement signed with Eaton/Nova
1984
ĦE Installed first Epitaxy Reactor
ĦE Installed first DDC Diffusion & LPCVD systems
ĦE Integrated systems with array processors for hi-speed real-time
data acquisition and control applications
1983
ĦE Moved to Jen-Ai Road, Taipei, Taiwan
1982
ĦE First Nanoline introduced and marked Taiwan's
entry into Si-gate technology
ĦE Started system integration of Data Acquisition systems for industrial,
military & academic application
1981
ĦE Installed first Optical Fiber CVD systems1980
Introduced Production Ellipsometer, Nanospec, Magnetron Sputter
systems for Taiwanese market
2000-2009 1990-1999 1980-1989 1970-1979
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